CNN-Based Layout Segment Classification for Analysis of Layout-Induced Failures
暂无分享,去创建一个
Masayuki Arai | Satoshi Fukumoto | Yoshikazu Nagamura | Takashi Ide | Yoshikazu Nagamura | M. Arai | S. Fukumoto | Takashi Ide
[1] Cyrus Shahabi,et al. A Deep Learning Approach for Road Damage Detection from Smartphone Images , 2018, 2018 IEEE International Conference on Big Data (Big Data).
[2] Andrew Zisserman,et al. Very Deep Convolutional Networks for Large-Scale Image Recognition , 2014, ICLR.
[3] M. Komagata,et al. A new method of reducing the particle contamination in semiconductor manufacturing , 1995, Proceedings of 1995 Japan International Electronic Manufacturing Technology Symposium.
[4] C. Kok,et al. Study of microscopic defects in silicon oxynitride films prepared by plasma-enhanced chemical vapor deposition process , 2008, 2008 IEEE International Conference on Electron Devices and Solid-State Circuits.
[5] Byung-Gyu Kim,et al. Efficient Facial Expression Recognition Algorithm Based on Hierarchical Deep Neural Network Structure , 2019, IEEE Access.
[6] Geoffrey E. Hinton,et al. On the importance of initialization and momentum in deep learning , 2013, ICML.
[7] Xuemei Xi,et al. A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics , 2003, Proceedings of the IEEE 2003 Custom Integrated Circuits Conference, 2003..
[8] Yici Cai,et al. SAT based multi-net rip-up-and-reroute for manufacturing hotspot removal , 2010, 2010 Design, Automation & Test in Europe Conference & Exhibition (DATE 2010).
[9] Maozhen Li,et al. Zero Defect Manufacturing of Microsemiconductors – An Application of Machine Learning and Artificial Intelligence , 2018, 2018 5th International Conference on Systems and Informatics (ICSAI).
[10] Oded Cohen,et al. Machine Learning and Big Data in optical CD metrology for process control , 2018, 2018 e-Manufacturing & Design Collaboration Symposium (eMDC).
[11] M. Pfost,et al. Influence of metallization layout on aging detector lifetime under cyclic thermo-mechanical stress , 2016, 2016 IEEE International Reliability Physics Symposium (IRPS).
[12] Kunihiro Hosono,et al. Photomask quality assessment strategy at 90-nm technology node with aerial image simulation , 2003, Photomask Japan.
[13] Shiva Darshan S.L,et al. Windows Malware Detector Using Convolutional Neural Network Based on Visualization Images , 2019, IEEE Transactions on Emerging Topics in Computing.
[14] Hashimoto Atsushi,et al. Stroke Recovery of Handwritten Chinese Character using Fully Convolutional Networks , 2018 .
[15] Shayak Banerjee,et al. Design driven patterning optimizations for low K1 lithography , 2012, 2012 IEEE International Conference on IC Design & Technology.
[16] Shi-Chung Chang,et al. Anomaly Detection for Semiconductor Tools Using Stacked Autoencoder Learning , 2018, 2018 International Symposium on Semiconductor Manufacturing (ISSM).
[17] Ke Huang,et al. IC layout weak point effectiveness evaluation based on statistical methods , 2018, 2018 IEEE 36th VLSI Test Symposium (VTS).
[18] S. Orain,et al. A constitutive single crystal model for the silicon mechanical behavior: applications to the stress induced by silicided lines and STI in MOS technologies , 2005, EuroSimE 2005. Proceedings of the 6th International Conference on Thermal, Mechanial and Multi-Physics Simulation and Experiments in Micro-Electronics and Micro-Systems, 2005..
[19] Rebecca Mih. Trends in Manufacturing Productivity and Yield Enhancement for Interconnected Devices and Industries , 2018, 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM).
[20] Michael Orshansky,et al. SMATO: Simultaneous mask and target optimization for improving lithographic process window , 2010, 2010 IEEE/ACM International Conference on Computer-Aided Design (ICCAD).
[21] David Z. Pan,et al. Machine learning for mask/wafer hotspot detection and mask synthesis , 2017, Photomask Technology.
[22] B. Klöter. Application of machine learning for production optimization , 2018, 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC).
[23] Ali Farhadi,et al. YOLO9000: Better, Faster, Stronger , 2016, 2017 IEEE Conference on Computer Vision and Pattern Recognition (CVPR).
[24] Michael C. Mozer,et al. Adapted Deep Embeddings: A Synthesis of Methods for k-Shot Inductive Transfer Learning , 2018, NeurIPS.
[25] K. Sakiyama,et al. Defect-free shallow P/N junction by point defect engineering , 1992, 30th Annual Proceedings Reliability Physics 1992.
[26] Chang Ouk Kim,et al. Convolutional Neural Network for Wafer Surface Defect Classification and the Detection of Unknown Defect Class , 2019, IEEE Transactions on Semiconductor Manufacturing.
[27] Shigeki Nojima,et al. Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection , 2018, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[28] Sudhakar M. Reddy,et al. Automatic Identification of Yield Limiting Layout Patterns Using Root Cause Deconvolution on Volume Scan Diagnosis Data , 2017, 2017 IEEE 26th Asian Test Symposium (ATS).
[29] Philippe Hurat,et al. Standard cell printability grading and hot spot detection , 2005, Sixth international symposium on quality electronic design (isqed'05).
[30] Matheus Palhares Viana,et al. Fast CNN-Based Document Layout Analysis , 2017, 2017 IEEE International Conference on Computer Vision Workshops (ICCVW).
[31] Jee-Hyong Lee,et al. CNN Based Lithography Hotspot Detection , 2016, Int. J. Fuzzy Log. Intell. Syst..
[32] Tsuyoshi Moriya,et al. Machine Learning Approaches for Process Optimization , 2018, 2018 International Symposium on Semiconductor Manufacturing (ISSM).
[33] Kitaguchi Katsuhisa,et al. Analysis of the Resion of Interest in Visual Inspection using CNN , 2018 .
[34] Radu Grosu,et al. Unsupervised Wafermap Patterns Clustering via Variational Autoencoders , 2018, 2018 International Joint Conference on Neural Networks (IJCNN).
[35] Y. Li,et al. Effect of metal layout design on passivation crack occurrence using both experimental and simulation techniques , 2004, 5th International Conference on Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, 2004. EuroSimE 2004. Proceedings of the.
[36] Michael Orshansky,et al. Analysis of systematic variation and impact on circuit performance , 2008, SPIE Advanced Lithography.
[37] Ryohei Orihara,et al. A Comprehensive Big-Data-Based Monitoring System for Yield Enhancement in Semiconductor Manufacturing , 2017, IEEE Transactions on Semiconductor Manufacturing.
[38] Roman Kern,et al. A Comparison of Supervised Approaches for Process Pattern Recognition in Analog Semiconductor Wafer Test Data , 2018, 2018 17th IEEE International Conference on Machine Learning and Applications (ICMLA).
[39] Lin Cong,et al. Systematic co-optimization from chip design, process technology to systems for GPU AI chip , 2018, 2018 International Symposium on VLSI Design, Automation and Test (VLSI-DAT).
[40] David Z. Pan,et al. Lithography hotspot detection and mitigation in nanometer VLSI , 2013, 2013 IEEE 10th International Conference on ASIC.
[41] Yoshiyuki Nakamura,et al. Good Die Prediction Modelling from Limited Test Items , 2018, 2018 IEEE International Test Conference in Asia (ITC-Asia).
[42] Pietro Babighian,et al. Systematic defect detection methodology for volume diagnosis: A data mining perspective , 2017, 2017 IEEE International Test Conference (ITC).
[43] Evangeline F. Y. Young,et al. Layout hotspot detection with feature tensor generation and deep biased learning , 2017, 2017 54th ACM/EDAC/IEEE Design Automation Conference (DAC).
[44] Evangeline F. Y. Young,et al. A fast machine learning-based mask printability predictor for OPC acceleration , 2019, ASP-DAC.
[45] Meng Li,et al. Litho-GPA: Gaussian Process Assurance for Lithography Hotspot Detection , 2019, 2019 Design, Automation & Test in Europe Conference & Exhibition (DATE).
[46] Andrei S. Salnikov,et al. Plasma-Chemical Etching Process Behavioral Models Based on Tree Ensembles and Neural Network , 2018, 2018 XIV International Scientific-Technical Conference on Actual Problems of Electronics Instrument Engineering (APEIE).
[47] Tohru Mogami. Perspectives of CMOS technology from the viewpoint of variability , 2010, 2010 International Symposium on Semiconductor Manufacturing (ISSM).
[48] Junguo Lu,et al. Fault detection for semiconductor quality control based on Spark using data mining technology , 2018, 2018 Chinese Control And Decision Conference (CCDC).
[49] Impurity and point defect redistribution in the presence of crystal defects , 1990, International Technical Digest on Electron Devices.
[50] Chikaaki Kodama,et al. Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation , 2017, 2017 22nd Asia and South Pacific Design Automation Conference (ASP-DAC).
[51] Jean-Luc Paris,et al. Optimizing simulated manufacturing systems using machine learning coupled to evolutionary algorithms , 2001, ETFA 2001. 8th International Conference on Emerging Technologies and Factory Automation. Proceedings (Cat. No.01TH8597).
[52] Xuan Zeng,et al. Faster Region-based Hotspot Detection , 2019, 2019 56th ACM/IEEE Design Automation Conference (DAC).
[53] Shoji Inoue,et al. Killer defect detection using the IR-OBIRCH (infrared optical-beam-induced resistance-change) method , 1999, 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314).
[54] Peter Jacob. Defect- and structure-weakness-localization on power semiconductors using OBIRCH (optical beam induced resistivity change) , 2002, Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614).
[55] Han Xian-Hua,et al. Computer-Aided Diagnosis of Liver Cancers Using Deep Learning with Fine-tuning , 2018 .