CMOS voltage reference based on gate work function differences in poly-Si controlled by conductivity type and impurity concentration
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K. Taniguchi | K. Taniguchi | H. Watanabe | Hirobumi Watanabe | Shunsuke Ando | H. Aota | M. Dainin | Y. Chun | S. Ando | H. Aota | M. Dainin | Yong-Jin Chun
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