论文信息 - Single-mask processing of micromechanical piercing structures using ion milling (biomedical tissue fasteners)

Single-mask processing of micromechanical piercing structures using ion milling (biomedical tissue fasteners)

A useful method for transferring mask patterns over large distances using ion milling is described. This technique exploits the anisotropy of a collimated ion beam to etch the projection of a stencil mask pattern into a thin film. This method avoids the difficulties associated with photoresist processing on highly nonplanar substrates, and thus provides an alternative process avenue for the development of three-dimensional microstructures. The technique is demonstrated by fabricating arrays of high aspect ratio barbs, which are intended for use in tissue fasteners in biomedical applications.<<ETX>>

Hongtao Han | Michael L. Reed | R. Dizon

[1] H. L. Offereins,et al. Methods for the fabrication of convex corners in anisotropic etching of (100) silicon in aqueous KOH , 1990 .

[2] Michael L. Reed,et al. Silicon micro‐velcro , 1992 .

[3] K. Bean,et al. Anisotropic etching of silicon , 1978, IEEE Transactions on Electron Devices.

[4] W. Ko,et al. Compensating corner undercutting in anisotropic etching of (100) silicon , 1989 .

[5] Willy Sansen,et al. Compensation structures for convex corner micromachining in silicon , 1990 .

[6] Helmut Seidel,et al. Three-dimensional structuring of silicon for sensor applications , 1983 .

[7] Lee E. Weiss,et al. Mating and piercing micromechanical structures for surface bonding applications , 1991, [1991] Proceedings. IEEE Micro Electro Mechanical Systems.