Mechanism and observation of Mott transition in VO2-based two- and three-terminal devices

When holes of about 0.018% are induced into a conduction band (breakdown of critical on-site Coulomb energy), an abrupt first-order Mott metal–insulator transition (MIT) rather than a continuous Hubbard MIT near a critical on-site Coulomb energy U/Uc=1, where U is on-site Coulomb energy between electrons, is observed on an inhomogeneous VO2 film, a strongly correlated Mott insulator. As a result, discontinuous jumps of the density of states on the Fermi surface are observed and inhomogeneity inevitably occurs. The off-current and temperature dependences of the abrupt MIT in a two-terminal device and the gate effect in a three-terminal device are clear evidence that the abrupt Mott MIT was induced by the excitation of holes. Raman spectra measured by a micro-Raman system show an MIT without the structural phase transition. Moreover, the magnitude of the observed jumps ΔJobserved at the abrupt MIT is an average over an inhomogeneous measurement region of the maximum true jump, ΔJtrue, deduced from the Brinkman–Rice picture. A brief discussion of whether VO2 is a Mott insulator or a Peierls insulator is presented.