Issues with contact defect test structures

The design of contact defect test structures is described. The results from measurements of polysilicon contact defect test structures on a series of wafer lots are given. The different types of yield models used for yield projections are also described. Even if an open contact does occur in an isolation transistor, for example, it is shown that the isolation integrity remains essentially unchanged.<<ETX>>

[1]  U. Lieneweg,et al.  Flange correction to four-terminal contact resistance measurements , 1990, International Conference on Microelectronic Test Structures.

[2]  O. Paz,et al.  Modification of Poisson statistics: modeling defects induced by diffusion , 1977 .

[3]  C. H. Stapper.  On a composite model to the IC yield problem , 1975 .

[4]  C.H. Stapper,et al.  Integrated circuit yield statistics , 1983, Proceedings of the IEEE.

[5]  A. Scorzoni,et al.  Current crowding and misalignment effects as sources of error in contact resistivity measurements—Part II: Experimental results and computer simulation of self-aligned test structures , 1987, IEEE Transactions on Electron Devices.

[6]  C. Stapper.  Defect density distribution for LSI yield calculations , 1973 .

[7]  J. A. Mazer,et al.  Direct measurements of interfacial contact resistance, end contact resistance, and interfacial contact layer uniformity , 1983, IEEE Transactions on Electron Devices.

[8]  A. C. Ipri,et al.  Integrated circuit process and design rule evaluation techniques , 1977 .

[9]  Anthony J. Walton,et al.  The effect of contact geometry on the value of contact resistivity extracted from Kelvin structures , 1989, Proceedings of the 1989 International Conference on Microelectronic Test Structures.

[10]  S. Ido,et al.  The vertical test structure for measuring contact resistance between two kinds of metal , 1990, Proceedings of the 1991 International Conference on Microelectronic Test Structures.

[11]  A. J. Walton,et al.  Sources Of Error In Extracting The Specific Contact Resistance From Kelvin Device Measurements , 1988, Proceedings of the IEEE International Conference on Microelectronic Test Structures.