Substrate chucking member, substrate processing apparatus having the same and method of processing substrate using the same

Substrate chucking member is provided with parts of the substrate support member and the rotation control. A substrate support member is a substrate is loaded rotatable support plate, and the support is provided on the plate by the side of the loading board to the support plate supports the edge of the substrate sikimyeo spaced from the upper surface of the support plate to rotate the substrate that is rotated by supporting each a plurality of chuck that includes a kingpin. Rotation control unit is provided under the support plate, to control the rotation of each chuck kingpin. Chuck kingpin rotates the substrate during the process because changing the position at which the substrate and the chuck, the contact kingpin, this hit processing liquid to the chuck kingpin continues to change the falling position on the substrate. Accordingly, the substrate chucking member can prevent the defects in the end of the substrate.