Poly-Si films prepared by rapid thermal CVD on boron and phosphorus silicate glass coated ceramic substrates
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F. Snijkers | A. Slaoui | G. Beaucarne | J. Poortmans | J. Poortmans | E. Pihan | A. Focsa | P. Leempoel
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F. Snijkers | A. Slaoui | G. Beaucarne | J. Poortmans | J. Poortmans | E. Pihan | A. Focsa | P. Leempoel