Effects of thermally-activated diffusion on 72 keV Ni ion implantation into Cu targets at elevated temperatures
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[1] S. Lem,et al. The radiation stimulated diffusion role in high dose, low energy, high temperature ion implantation , 1997 .
[2] G. Kulcinski,et al. Computer simulation of ion beam mixing , 1990 .
[3] G. Leaf,et al. Mechanisms and kinetics of ion implantation , 1986 .
[4] L. Rehn,et al. Subsurface compositional modifications in NiCu alloys during high-temperature ion sputtering , 1985 .
[5] L. Rehn,et al. Radiation-induced segregation in Ni-Cu alloys , 1983 .
[6] L. Rehn,et al. Radiation-induced segregation in concentrated CuNi alloys , 1981 .
[7] M. Feller-Kniepmeier,et al. Quenching experiments on high‐purity nickel , 1976 .
[8] G. Kulcinski,et al. A study of high-temperature implantation of 72 keV copper ions into nickel , 2005 .
[9] P. Wilbur,et al. Metastable phase formation and enhanced diffusion in f.c.c. alloys under high dose, high flux nitrogen implantation at high and low ion energies , 1994 .
[10] R. Watkins. Solute redistribution during high dose, high temperature implantations of 60keVCu+ions into polycrystalline titanium , 1984 .
[11] Defect Clusters in B.C.C. Metals,et al. Point defects and defect interactions in metals , 1982 .
[12] R. Piller,et al. Modification of implant profiles in nickel by radiation-enhanced diffusion and segregation , 1980 .