Configuration and management strategies for cluster-based fabs

New models of conventional and single-wafer, cluster-based fabs running 0.35 micron logic flows have been developed based almost entirely on existing equipment technology. The cluster-based fabs are an embodiment of an alternative approach to semiconductor manufacturing, which is referred to as adaptable manufacturing systems (ASMs). Relative to conventional fabs, AMSs seek to balance throughput time and cost requirements, rather than only focusing on cost reduction as the dominant objective. The models are used to contrast the major components of throughput time and cost in the different types of fabs. Next, the models are used to show that that the optimal fab configurations and management strategies of the AMSs change over the life cycle of the fab. Making these changes at key points in the fab's life cycle allow the AMS to be more responsive to changing market demands, compared to conventional fabs.<<ETX>>

[1]  K. C. Saraswat,et al.  Performance Evaluation Of Adaptable Manufacturing Systems For Semiconductor IC Production , 1993, Symposium 1993 on VLSI Technology.

[2]  R. Fair.  1 – Rapid Thermal Processing—A Justification , 1993 .

[3]  Robert R. Doering.  Trends in single-wafer processing , 1992, 1992 Symposium on VLSI Technology Digest of Technical Papers.

[4]  Habib N. Najm,et al.  Single-wafer integrated semiconductor device processing , 1992 .

[5]  E. Bok,et al.  SUPERCRITICAL FLUIDS FOR SINGLE WAFER CLEANING , 1992 .

[6]  Pallab K. Chatterjee.  ULSI market opportunities and manufacturing challenges , 1991, International Electron Devices Meeting 1991 [Technical Digest].

[7]  R. Chapman,et al.  High performance sub-half micron CMOS using rapid thermal processing , 1991, International Electron Devices Meeting 1991 [Technical Digest].

[8]  G. B. Larrabee.  The intelligent microelectronics factory of the future , 1991, 1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium.

[9]  Krishna C. Saraswat,et al.  Modeling the performance of cluster-based fabs , 1991, 1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium.

[10]  Mehrdad M. Moslehi,et al.  Temperature Uniformity Optimization Using Three-Zone Lamp and Dynamic Control in Rapid Thermal Multiprocessor , 1991 .

[11]  R. A. Bowling,et al.  Dry cleaning procedure for silicon IC fabrication , 1990, International Technical Digest on Electron Devices.

[12]  David V. Horak,et al.  Cluster Processing For 16-Mb DRAM Production , 1990, Other Conferences.