Stabilized resistive switching behaviors of a Pt/TaOx/TiN RRAM under different oxygen contents
暂无分享,去创建一个
Honggi Kim | Hyungtak Seo | Hyeongtag Jeon | Hyunjung Kim | Heeyoung Jeon | H. Seo | Jingyu Park | Woochool Jang | Hyunjung Kim | H. Jeon | Heeyoung Jeon | Jingyu Park | Woochool Jang | Chunho Kang | Hyoseok Song | Honggi Kim | Chunho Kang | Hyoseok Song
[1] R. Waser,et al. Nanoionics-based resistive switching memories. , 2007, Nature materials.
[2] I. Milošev,et al. Comparison of TiN, ZrN and CrN hard nitride coatings: Electrochemical and thermal oxidation , 1997 .
[3] A. Sawa. Resistive switching in transition metal oxides , 2008 .
[4] S. Rhee,et al. Resistive switching characteristics of ZnO thin film grown on stainless steel for flexible nonvolatile memory devices , 2009 .
[5] D. K. Aswal,et al. Oxygen induced hysteretic current-voltage characteristics of iron-phthalocyanine thin films , 2008 .
[6] J Joshua Yang,et al. Memristive devices for computing. , 2013, Nature nanotechnology.
[7] Investigation for coexistence of dual resistive switching characteristics in DyMn2O5 memory devices , 2011 .
[8] Xiangkang Meng,et al. Field-induced resistive switching based on space-charge-limited current , 2007 .
[9] R. Waser. Resistive non-volatile memory devices (Invited Paper) , 2009 .
[10] Jea-Gun Park,et al. Oxygen Ion Drift‐Induced Complementary Resistive Switching in Homo TiOx/TiOy/TiOx and Hetero TiOx/TiON/TiOx Triple Multilayer Frameworks , 2012 .
[11] M. Seery,et al. Effect of N-doping on the photocatalytic activity of sol-gel TiO2. , 2012, Journal of hazardous materials.
[12] R. Dittmann,et al. Coexistence of Filamentary and Homogeneous Resistive Switching in Fe‐Doped SrTiO3 Thin‐Film Memristive Devices , 2010, Advanced materials.
[13] R. Waser,et al. Switching the electrical resistance of individual dislocations in single-crystalline SrTiO3 , 2006, Nature materials.
[14] Fu-Hsing Lu,et al. XPS analyses of TiN films on Cu substrates after annealing in the controlled atmosphere , 1999 .
[15] Amit Prakash,et al. Self-compliance-improved resistive switching using Ir/TaOx/W cross-point memory , 2013, Nanoscale Research Letters.
[16] Kinam Kim,et al. A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O(5-x)/TaO(2-x) bilayer structures. , 2011, Nature materials.
[17] Jae Hyuck Jang,et al. Atomic structure of conducting nanofilaments in TiO2 resistive switching memory. , 2010, Nature nanotechnology.
[18] Shimeng Yu,et al. Conduction mechanism of TiN/HfOx/Pt resistive switching memory: A trap-assisted-tunneling model , 2011 .
[19] J. Yang,et al. High switching endurance in TaOx memristive devices , 2010 .
[20] Sungho Kim,et al. A Comprehensive Study of the Resistive Switching Mechanism in $\hbox{Al/TiO}_{x}/\hbox{TiO}_{2}/\hbox{Al}$-Structured RRAM , 2009, IEEE Transactions on Electron Devices.
[21] Shimeng Yu,et al. HfOx-based vertical resistive switching random access memory suitable for bit-cost-effective three-dimensional cross-point architecture. , 2013, ACS nano.
[22] R. Dittmann,et al. Redox‐Based Resistive Switching Memories – Nanoionic Mechanisms, Prospects, and Challenges , 2009, Advanced materials.