论文信息 - Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography

Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography

A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of −23 dB was obtained.

[1] Munehiro Toyama,et al. Mach-Zehnder filter using multiple Si waveguide structure sections for width error tolerance , 2012 .

[2] Munehiro Toyama,et al. The impacts of ArF Excimer Immersion Lithography on Integrated Silicon Photonics Tech. , 2012 .

[3] Shankar Kumar Selvaraja,et al. Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors , 2012 .

[4] D. Van Thourhout,et al. Silicon-on-Insulator Spectral Filters Fabricated With CMOS Technology , 2010, IEEE Journal of Selected Topics in Quantum Electronics.

[5] Munehiro Toyama,et al. Si wire array waveguide grating with parallel star coupler configuration fabricated by ArF excimer immersion lithography , 2013 .

[6] T. Shoji,et al. Microphotonics devices based on silicon microfabrication technology , 2005, IEEE Journal of Selected Topics in Quantum Electronics.