Challenges in nanometrology: high precision measurement of position and size

Abstract Recent developments of the PTB in high precision position and size metrology as support for different nanotechnology applications are described. Measurement uncertainties of 1–2 nm for 1D-position of graduation lines on photomasks, or on line scales and incremental encoders of about 300 mm length have been achieved. The measurement of the size of nanoscale features represents additional challenges, because the location of opposite feature edges needs to be precisely determined. Different feature size or CD metrology techniques are applied at PTB, including a recent approach which uses transmission electron microscopy in the traceability chain of AFM CD measurements. The estimated uncertainty for CD measurements on high quality Si line structures is U95% = 1.6 nm.

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