High power and short pulse RF-excited CO2 laser MOPA system for LLP EUV light source
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Tatsuya Ariga | Akira Endo | Hideo Hoshino | Taisuke Miura | A. Endo | H. Hoshino | T. Miura | T. Ariga
[1] Taisuke Miura,et al. A 100-kHz thin disk Yb:YAG regenerative amplifier , 2006, SPIE LASE.
[2] A. Giesen,et al. Power scalability of thin disk lasers in fundamental mode operation , 2005, CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005..
[3] Tatsuhiko Sakai,et al. Q-switched CO2 laser using intense pulsed rf discharge and high-speed rotating chopper , 1995, International Symposium on High Power Laser Systems and Applications.
[4] Hiroyuki Furukawa,et al. Development of EUV light source by laser-produced plasma , 2006 .
[5] Tatsuya Ariga,et al. EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma , 2005, SPIE Optics + Photonics.
[6] Masaki Nakano,et al. High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma , 2004, SPIE Optics + Photonics.
[7] Hiroki Tanaka,et al. Emission characteristics of EUV light source by CO2 laser-produced Xe and Sn plasma , 2004, SPIE High-Power Laser Ablation.
[8] Tatsuya Ariga,et al. Development of short pulse and high power CO2 laser for EUV lithography , 2005, SPIE Optics + Photonics.