Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position
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[1] P. Nealey,et al. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns , 2016, Scientific Reports.
[2] Juan J de Pablo,et al. Molecular pathways for defect annihilation in directed self-assembly , 2015, Proceedings of the National Academy of Sciences.
[3] Clifford L. Henderson,et al. Calculations of the free energy of dislocation defects in lamellae forming diblock copolymers using thermodynamic integration , 2016 .
[4] Clifford L. Henderson,et al. Detailed molecular dynamics studies of block copolymer directed self-assembly: Effect of guiding layer properties , 2013 .
[5] R. Ruiz,et al. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly , 2008, Science.
[6] Joe Lee,et al. Single-expose patterning development for EUV lithography , 2017, Advanced Lithography.
[7] Pak Lui,et al. Strong scaling of general-purpose molecular dynamics simulations on GPUs , 2014, Comput. Phys. Commun..
[8] Steven Barcelo,et al. Nanoimprint lithography for nanodevice fabrication , 2016, Nano Convergence.
[9] Yi Cao,et al. DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC , 2016, SPIE Advanced Lithography.
[10] Jianhui Shan,et al. Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process , 2015, Advanced Lithography.
[11] Katsuyoshi Kodera,et al. Sub-10-nm patterning process using directed self-assembly with high χ block copolymers , 2015 .
[12] Clifford L. Henderson,et al. Coarse grained molecular dynamics model of block copolymer directed self-assembly , 2013 .
[13] M. Morris,et al. Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties. , 2016, Nanoscale.
[14] Roel Gronheid,et al. Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly. , 2016, ACS applied materials & interfaces.
[15] F. Bates,et al. Conformationally asymmetric block copolymers , 1997 .
[16] Clifford L. Henderson,et al. Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing , 2016 .
[17] Juan J. de Pablo,et al. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features , 2013 .
[18] Helmut Schift,et al. Next-generation lithography – an outlook on EUV projection and nanoimprint , 2017 .
[19] Obert Wood,et al. A study on EUV reticle surface molecular contamination under different storage conditions in a HVM foundry fab , 2017, Advanced Lithography.
[20] Rina Maeda,et al. Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute , 2016, Scientific Reports.
[21] Juan J. de Pablo,et al. Free Energy of Defects in Ordered Assemblies of Block Copolymer Domains. , 2012, ACS macro letters.
[22] Christophe Navarro,et al. Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films , 2015, Advanced materials.
[23] M. Morris,et al. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. , 2016, ACS applied materials & interfaces.