Grain boundary evaluation in sequentially laterally solidified polycrystalline-silicon devices
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M. Rapisarda | Luigi Mariucci | S. D. Brotherton | Antonio Valletta | A. Bonfiglietti | G. Fortunato | G. Fortunato | L. Mariucci | M. Rapisarda | A. Valletta | A. Bonfiglietti
[1] S. M. Sze,et al. Physics of semiconductor devices , 1969 .
[2] J. Seto. The electrical properties of polycrystalline silicon films , 1975 .
[3] C. Canali,et al. Electron and hole drift velocity measurements in silicon and their empirical relation to electric field and temperature , 1975, IEEE Transactions on Electron Devices.
[4] P. J. Scanlon,et al. Conductivity behavior in polycrystalline semiconductor thin film transistors , 1982 .
[5] A. N. Khondker,et al. Theory of conduction in polysilicon: Drift-diffusion approach in crystalline-amorphous-crystalline semiconductor system—Part I: Small signal theory , 1984, IEEE Transactions on Electron Devices.
[6] P. Ciampolini,et al. Numerical simulation of polycrystalline-Silicon MOSFET's , 1986, IEEE Transactions on Electron Devices.
[7] S. Nelson,et al. Determination of grain‐boundary defect‐state densities from transport measurements , 1991 .
[8] H. Kong,et al. TWO-DIMENSIONAL SIMULATION STUDY OF FIELD-EFFECT OPERATION IN UNDOPED POLY-SI THIN-FILM TRANSISTORS , 1995 .
[9] J. R. Ayres,et al. Control and analysis of leakage currents in poly‐Si thin‐film transistors , 1996 .
[10] G. A. Armstrong,et al. Modeling of laser-annealed polysilicon TFT characteristics , 1997, IEEE Electron Device Letters.
[11] L. Colalongo,et al. Numerical analysis of electrical characteristics of polysilicon thin film transistors fabricated by excimer laser crystallisation , 1998 .
[12] Differentiation of Effects due to Grain and Grain Boundary Traps in Laser Annealed Poly-Si Thin Film Transistors , 1998 .
[13] James S. Im,et al. Controlled Super‐Lateral Growth of Si Films for Microstructural Manipulation and Optimization , 1998 .
[14] J. Kanicki,et al. Two-Dimensional Numerical Simulation of Solid-Phase-Crystallized Polysilicon Thin-Film Transistor Characteristics , 1999 .
[15] Apostolos T. Voutsas. Assessment of the performance of laser-based lateral-crystallization technology via analysis and modeling of polysilicon thin-film-transistor mobility , 2003 .
[16] Apostolos T. Voutsas,et al. Effect of process parameters on the structural characteristics of laterally grown, laser-annealed polycrystalline silicon films , 2003 .
[17] Design of Sequential Lateral Solidification Crystallization Method for Low Temperature Poly-Si Thin Film Transistors , 2004 .
[18] Y. Mitani,et al. Sequential lateral solidification processing for polycrystalline Si TFTs , 2004, IEEE Transactions on Electron Devices.