论文信息 - Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition. - 字舞流文

Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition.

Soo‐Hyun Kim | J. Bae | M. Z. Ansari | D. Mohapatra | Gahui Kim | Young-Bae Park | Y. Mori | Wooseok Song | Taehoon Cheon | Yujin Jang | Y. Kotsugi | Han‐Bo‐Ram Lee | Youn-Hye Kim | W. Kwon | Y. Park