ACS Nano, volume 7, issue 5, pages 4520–4526, year 2013 // Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition

Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition Anthoula C. Papageorgiou, a) Sybille Fischer, Seung Cheol Oh, Özge Sağlam, Joachim Reichert, b) Alissa Wiengarten, Knud Seufert, Saranyan Vijayaraghavan, David Écija, Willi Auwärter, Francesco Allegretti, c) Robert G. Acres, Kevin C. Prince, Katharina Diller, Florian Klappenberger, and Johannes V. Barth Physik Department E20, Technische Universität München, 85748 Garching, Germany Sincrotrone Trieste, Strada Statale 14, km 163.5, 34149 Basovizza, Trieste, Italy

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