Determination of the parameters for the back-to-back switched Schottky barrier structures

The Cr/n-GaAs/Cr and Ag/p-GaAs/Ag metal–semiconductor–metal (MSM) Schottky contacts have been fabricated by reactive radio frequency (RF) sputtering system. The current–voltage ðI—VÞ and capacitance–voltage ðC—VÞ characteristics of the devices have been investigated in the temperature range of 80–316 K for the back-to-back switched Schottky barrier contacts. These measurements establish that the room temperature barrier height determined from reverse branch of the current–voltage characteristics is close to the value obtained from capacitance–voltage measurements.