A New Family of Positive Electron Beam Resists—Poly(Olefin Sulfones)

Poly(olefin sulfones) are shown to represent a new class of positive electron beam resists exhibiting sensitivities in the region of 1.3 x 10-6 coulombs cm-2. Processing variables are evaluated and exposure characteristics determined. These materials can be used in two development modes, (i) as a conventional solvent-developed system and (ii) as a system which self develops during electron-beam irradiation by depolyrmerization followed by vaporization. Limitations of this vapor development'' process are discussed.