Investigation of thickness-dependent stress in PbTiO3 thin films

X-ray diffraction (XRD) and Raman spectroscopy were used to investigate stress dependence on thickness in PbTiO3 (PTO) films grown by pulsed liquid injection metalorganic chemical vapor deposition on a LaAlO3 (001) substrate (LAO). Films on sapphire substrate (R plane) were used as the polycrystalline film reference. Epitaxial PTO films with a dominant c domain structure are grown on LAO substrate, whereas the films on sapphire are polycrystalline. A detailed investigation of the PTO/LAO film microstructure by XRD gives evidence of PTO twinning. Both techniques reveal that PTO films are under tensile in-plane stresses. The study of the film thickness dependence of microstrains, grain size, volume fraction of a domains, as well as surface morphology of PTO/LAO films indicates that these parameters are clearly correlated. A change in the relaxation mechanism between 65 and 125 nm of film thickness has been evidenced. A c parameter gradient occurs throughout the film depth; it originates in stress relaxation...

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