Etched ion tracks in silicon oxide and silicon oxynitride as charge injection or extraction channels for novel electronic structures
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D. Fink | F. Faupel | A. Biswas | W. Fahrner | A. Berdinsky | L. T. Chadderton | A. Chemseddine | R. Papaléo | A. Chandra | A. Petrov | K. Hoppe | A. Zrineh | W. R. Fahrner