Low-frequency noise behavior of junctionless transistors compared to inversion-mode transistors

Abstract Low-frequency (LF) noise characteristics of wide planar junctionless transistors (JLTs) are investigated. Interestingly, carrier number fluctuation is the main contributor to the LF noise behavior of JLT devices, even though their bulk conduction features are clearly proved by the extracted flat-band voltage (Vfb). This is explained by the fact that mobile electrons in depletion, originating from the bulk neutral channel or source/drain regions, can interact with slow traps in the gate oxide, giving rise in return to fluctuations of the charge density in the bulk neutral channel. Similar values of trap density (Nt) are extracted in JLT devices and inversion-mode (IM) t0072ansistors, which also supports that the LF noise of JLT is well explained by the carrier number fluctuation model.

[1]  Adrian M Ionescu,et al.  Nanowire transistors made easy. , 2010, Nature nanotechnology.

[2]  M. Armstrong,et al.  Comparison of Junctionless and Conventional Trigate Transistors With $L_{g}$ Down to 26 nm , 2011, IEEE Electron Device Letters.

[3]  Mikael Östling,et al.  Low-Frequency Noise in Advanced MOS Devices , 2007 .

[4]  Jean-Pierre Colinge,et al.  Low-frequency noise in junctionless multigate transistors , 2011 .

[5]  J. Colinge,et al.  Random telegraph-signal noise in junctionless transistors , 2011 .

[6]  Chi-Woo Lee,et al.  Nanowire transistors without junctions. , 2010, Nature nanotechnology.

[7]  Gérard Ghibaudo,et al.  Electrical noise and RTS fluctuations in advanced CMOS devices , 2002, Microelectron. Reliab..

[8]  D. Schroder Semiconductor Material and Device Characterization , 1990 .

[9]  J. Sallese,et al.  Charge-Based Modeling of Junctionless Double-Gate Field-Effect Transistors , 2011, IEEE Transactions on Electron Devices.

[10]  Gerard Ghibaudo,et al.  Improved Analysis of Low Frequency Noise in Field‐Effect MOS Transistors , 1991 .

[11]  F. Balestra Nanoscale CMOS: Innovative Materials, Modeling and Characterization , 2010 .

[12]  J. A. Chroboczek,et al.  Automatic, wafer-level, low frequency noise measurements for the interface slow trap density evaluation , 2003, International Conference on Microelectronic Test Structures, 2003..

[13]  Chi-Woo Lee,et al.  Reduced electric field in junctionless transistors , 2010 .