Hollow nanostructures based on the Kirkendall effect: Design and stability considerations
暂无分享,去创建一个
[1] K. Vaughn,et al. Public Debt Controversies: An Essay in Reconciliation , 1992 .
[2] M. Nicolet,et al. Identification of the dominant diffusing species in silicide formation , 1974 .
[3] J. Buchanan,et al. The Incidence and Effects of Public Debt in the Absence of Fiscal Illusion , 1987 .
[4] R. Barro. Are Government Bonds Net Wealth? , 1974, Journal of Political Economy.
[5] King-Ning Tu,et al. Kinetic theory of flux-driven ripening , 2002 .
[6] Y. Murase,et al. Fatigue behavior of 20% cold-worked 316 stainless steel under in situ irradiation with 17 MeV protons at 60 °C , 2002 .
[7] D. R. Frear,et al. Electron microscopy study of interfacial reaction between eutectic SnPb and Cu/Ni(V)/Al thin film metallization , 2000 .
[8] W. Chu,et al. Structure and growth kinetics of Ni2Si on silicon , 1975 .
[9] I. Lifshitz,et al. The kinetics of precipitation from supersaturated solid solutions , 1961 .
[10] Paul Shewmon,et al. Diffusion in Solids , 2016 .
[11] A. Sullivan,et al. Microeconomics: Principles and Tools , 1997 .
[12] Kazuaki Ano,et al. Kirkendall void formation in eutectic SnPb solder joints on bare Cu and its effect on joint reliability , 2005 .
[13] A. Smigelskas. Zinc diffusion in alpha brass , 1947 .
[14] Robert C. Cook,et al. World Population Prospects , 1966 .
[15] Gabor A. Somorjai,et al. Formation of Hollow Nanocrystals Through the Nanoscale Kirkendall Effect , 2004, Science.
[16] U. Gösele,et al. Point defects, diffusion processes, and swirl defect formation in silicon , 1985 .
[17] Christophe Detavernier,et al. Towards implementation of a nickel silicide process for CMOS technologies , 2003 .
[18] King-Ning Tu,et al. Growth kinetics of planar binary diffusion couples: ’’Thin‐film case’’ versus ’’bulk cases’’ , 1982 .