Conduction mechanism of highly conductive and transparent zinc oxide thin films prepared by magnetron sputtering

Abstract This report describes the results of experimental and theoretical studies of the electrical properties of highly conductive and transparent ZnO thin films prepared by magnetron sputtering. The mobilities of undoped and Al-doped ZnO (AZO) films (carrier concentration 10 20 -10 21 cm -3 ), which are relatively independent of the crystal quality, are mainly dominated by ionized impurity scattering. The relationship between the carrier concentration and the mobility of AZO films can be interpreted by the Brooks-Herring theory when both the degeneracy and nonparabolicity of the conduction band are taken into account. The origin of carriers in AZO films is also discussed.

[1]  C. Granqvist,et al.  Transparent and infrared-reflecting ZnO:Al films reactively sputtered onto polyester foil. , 1987, Applied optics.

[2]  K. Zakrzewska,et al.  Scattering of Charge Carriers in Reactively Sputtered CdIn2O4 Thin Films , 1987, January 16.

[3]  C. Granqvist,et al.  Optical properties of transparent and heat reflecting ZnO:Al films made by reactive sputtering , 1987 .

[4]  Shinzo Takata,et al.  Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic field , 1982 .

[5]  Shinzo Takata,et al.  Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering , 1984 .

[6]  Walukiewicz Carrier scattering by native defects in heavily doped semiconductors. , 1990, Physical review. B, Condensed matter.

[7]  T. S. Moss,et al.  Handbook on semiconductors , 1980 .

[8]  Meyer,et al.  Ionized-impurity scattering in the strong-screening limit. , 1987, Physical review. B, Condensed matter.

[9]  C. Granqvist,et al.  Band-gap widening in heavily Sn-dopedIn2O3 , 1984 .

[10]  H. Nanto,et al.  Highly Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering , 1986 .

[11]  Takashi Mouri,et al.  Preparations of ZnO:Al transparent conducting films by d.c. magnetron sputtering , 1990 .

[12]  J. Seto The electrical properties of polycrystalline silicon films , 1975 .

[13]  Shinzo Takata,et al.  Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering , 1985 .

[14]  A. P. Roth,et al.  Absorption edge shift in ZnO thin films at high carrier densities , 1981 .

[15]  H. Nanto,et al.  Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering , 1985 .