Two-dimensional profiling of carriers in a buried heterostructure multi-quantum-well laser: Calibrated scanning spreading resistance microscopy and scanning capacitance microscopy
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Edward H. Sargent | G. Pakulski | Dayan Ban | T. Grevatt | A. J. SpringThorpe | St. J. Dixon-Warren | G. Knight | E. Sargent | D. Ban | A. Springthorpe | G. Pakulski | J. K. White | J. White | R. W. Streater | T. Grevatt | S. Dixon-Warren | R. Streater | G. Knight | S. Dixon‐Warren
[1] S. B. Alexander,et al. GaAlAs semiconductor diode laser 4-ary frequency shift key modulation at 100 Mbit/s , 1985 .
[3] Trudo Clarysse,et al. Lateral and Vertical Dopant Profiling in Semiconductors by Atomic Force Microscopy Using Conducting Tips , 1995 .
[4] Wilfried Vandervorst,et al. Two-dimensional carrier profiling of InP-based structures using scanning spreading resistance microscopy , 1999 .
[5] N. Chinone,et al. Suppression of leakage current in InGaAsP/InP buried heterostructure lasers by InAlAs strained current-blocking layers , 1991 .
[6] Vladimir A. Ukraintsev,et al. Scanning capacitance spectroscopy: An analytical technique for pn-junction delineation in Si devices , 1998 .
[7] Young Kuk,et al. Imaging of a silicon pn junction under applied bias with scanning capacitance microscopy and Kelvin probe force microscopy , 2000 .
[8] Mark Osowski,et al. Progress in InGaAs-GaAs selective-area MOCVD toward photonic integrated circuits , 1997 .
[9] K. Kavanagh,et al. Calibrated scanning spreading resistance microscopy profiling of carriers in III–V structures , 2001 .
[10] W. Vandervorst,et al. One‐ and two‐dimensional carrier profiling in semiconductors by nanospreading resistance profiling , 1996 .
[11] A. Takemoto,et al. Theoretical and experimental analysis of leakage current in InGaAsP BH lasers with p-n-p-n current blocking layers , 1999 .
[12] M. Kubota,et al. 1.3-μm AlGaInAs buried-heterostructure lasers , 1999, IEEE Photonics Technology Letters.
[13] C. C. Williams,et al. Direct comparison of cross‐sectional scanning capacitance microscope dopant profile and vertical secondary ion‐mass spectroscopy profile , 1996 .
[14] Joseph J. Kopanski,et al. Scanning capacitance microscopy measurement of two-dimensional dopant profiles across junctions , 1998 .
[15] D. Thomson,et al. High-resolution cross-sectional imaging of MOSFETs by scanning resistance microscopy , 1997, IEEE Electron Device Letters.
[16] C. Lent,et al. Clocking of molecular quantum-dot cellular automata , 2001 .
[17] J. Kang,et al. Nondestructive one-dimensional scanning capacitance microscope dopant profile determination method and its application to three-dimensional dopant profiles , 2000 .
[18] Trudo Clarysse,et al. Status and review of two-dimensional carrier and dopant profiling using scanning probe microscopy , 2000 .
[19] Clayton C. Williams,et al. SCANNING CAPACITANCE MICROSCOPE METHODOLOGY FOR QUANTITATIVE ANALYSIS OF P-N JUNCTIONS , 1999 .
[20] M. Caymax,et al. Contrast reversal in scanning capacitance microscopy imaging , 1998 .
[21] M. Hammar,et al. Topography dependent doping distribution in selectively regrown InP studied by scanning capacitance microscopy , 1998 .
[22] Cyrus Shafai,et al. Delineation of semiconductor doping by scanning resistance microscopy , 1994 .
[23] St. J. Dixon-Warren,et al. Scanning spreading resistance microscopy study of a metalorganic chemical vapor deposited grown InP optoelectronic structure , 2001 .