Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser

Abstract Extreme ultraviolet (EUV) emission in the 8–18 nm wavelength range from a new double-stream gas puff target irradiated with a Nd:YAG laser has been studied for the first time. The target was formed by pulsed injection of a xenon gas stream into a hollow gas stream from helium by using a double-nozzle setup. Strong EUV production near 11 nm from the double-stream xenon/helium target exceeding emissions from iron, copper, and tin solid targets was observed. This new result may be useful to design a laser-produced radiation source for EUV lithography.

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