Diffusion-less junctions and super halo profiles for PMOS transistors formed by SPER and FUSI gate in 45 nm physical gate length devices
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A. Veloso | M. Jurczak | A. Lauwers | R. Lindsay | C. Dachs | K. De Meyer | S. Biesemans | K. Henson | P. Eyben | S. Severi | R. Duffy | K. Anil | R. Camillo-Castillo | J. de Marneffe | J. Ramos | J. B. Pawlak | W. Vandervost