Low-threshold whispering-gallery-mode microlasers fabricated in a Nd:glass substrate by three-dimensional femtosecond laser micromachining.

We report on fabrication of whispering-gallery-mode microlasers in a Nd:glass chip by femtosecond laser three-dimensional micromachining. The main fabrication procedures include the fabrication of freestanding microdisks supported by thin pillars by femtosecond laser ablation of the glass substrate immersed in water, followed by CO2 laser annealing for surface smoothing. The quality (Q) factor of the fabricated microcavity is measured to be 1.065×10(6). Lasing is observed at a pump threshold as low as ~69 μW at room temperature with a continuous-wave laser diode operating at 780 nm. This technique allows for fabrication of microcavities of high Q factors in various dielectric materials, such as glasses and crystals.

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