Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators
暂无分享,去创建一个
[1] Andrew R. Neureuther,et al. Illustration of illumination effects on proximity, focus spillover, and design rules , 2009, Advanced Lithography.
[2] Andrew R. Neureuther,et al. Through-focus pattern matching applied to double patterning , 2009, Advanced Lithography.
[3] Harry J. Levinson,et al. Screening layouts for high-numerical aperture and polarization effects using pattern matching , 2005 .
[4] D.A. Antoniadis,et al. Transistor Performance Scaling: The Role of Virtual Source Velocity and Its Mobility Dependence , 2006, 2006 International Electron Devices Meeting.
[5] Konstantinos Adam,et al. Measuring optical image aberrations with pattern and probe based targets , 2002 .
[6] Sani R. Nassif,et al. Test structures for delay variability , 2002, TAU '02.
[7] Liang Teck Pang,et al. Measurement and analysis of variability in CMOS circuits , 2008 .
[8] Liang-Teck Pang,et al. Measurements and analysis of process variability in 90nm CMOS , 2006, 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings.
[9] Costas J. Spanos,et al. Hierarchical modeling of spatial variability with a 45nm example , 2009, Advanced Lithography.
[10] Andrew R. Neureuther,et al. No-fault assurance: linking fast process CAD and EDA , 2002, Photomask Technology.
[11] Borivoje Nikolic,et al. Measurement and analysis of variability in 45nm strained-Si CMOS technology , 2008, 2008 IEEE Custom Integrated Circuits Conference.