Evolution of microstructural and electrical properties of sputtered HfO2 ceramic thin films with RF power and substrate temperature
暂无分享,去创建一个
K. C. Das | J. Myoung | J. Kar | Do Hyang Kim | N. Tripathy | S. Ghosh | T. Lee | K. Das | D. H. Kim | Tae Il Lee | S. Ghosh