论文信息 - Evolution of microstructural and electrical properties of sputtered HfO2 ceramic thin films with RF power and substrate temperature - 字舞流文

Evolution of microstructural and electrical properties of sputtered HfO2 ceramic thin films with RF power and substrate temperature

K. C. Das | J. Myoung | J. Kar | Do Hyang Kim | N. Tripathy | S. Ghosh | T. Lee | K. Das | D. H. Kim | Tae Il Lee | S. Ghosh