Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
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Markos Trikeriotis | Emmanuel P. Giannelis | Christopher K. Ober | Christine Ouyang | C. Ober | E. Giannelis | Marie Kryask | Sovik Chakrabarty | Marie Kryask | M. Trikeriotis | C. Ouyang | Sovik Chakrabarty
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