Micromechanics For X-Ray Lithography And X-Ray Lithography For Micromechanics

X-ray masks are micromechanical structures. They are best fabricated from thin films of low atomic number materials with built-in tensile strain. Optimized low pressure chemical vapor deposited polysilicon films have the desired characteristics for excellent x-ray masks. They also offer many other application opportunities as stencil masks and optical filters. Deep x-ray lithography has been developed in Germany. Concepts in very thick photoresist processing are fundamentally involved in this procedure. The end result: nearly three-dimensional metal structures will be very beneficial to future micro-structure fabrication.