Influence of laser beam on transport dynamics of Si nanoparticles by laser ablation

To investigate nucleation area and transport dynamics of Si nanoparticles, nanocrystalline silicon films were prepared by pulsed laser ablation. Subsequently, the additional laser beam as energy source was introduced, which crossed vertically the plasma plume from the top down in front of the target at a distance of 0.5 cm under same experiment condition. In this region, due to collision between the photon and the plasma plume, the transport of Si nanoparticles was impacted by the cross-laser beam. The Raman and x-ray diffraction spectra (XRD), scanning electron microscopy (SEM) images of the films showed that Si nanoparticles were formed in a certain range, and the average size of Si nanoparticles monotonically decreases with the increase of distance. Obviously, the range of Si nanoparticles deposited in substrates became narrower due to the influence of additional laser beam. Experimental results were analyzed in terms of the nucleation area model.