노광장비 내 유동특성 규명을 통한 입자제어

An exposure process, which is making a pattern at photoresist, is one of the key technologies in the field of semiconductor chip production. Therefore, researches on performance improvement of an exposure apparatus have been carried out recently. In this paper, CFD was used to predict the flow characteristics numerically in exposure apparatus in order to suggest the new shape for performance improvement. For them, analyses were performed for seven different shapes of exposure apparatus and parametric studies were carried out to suggest the efficient flow scheme that can reduce the vortex. As the results of this study, vortex is generally formed in the stage that is occurred an exposure at granite surface plate gap. Consequently, it is also found the modified shape which can reduce the strength of vortex in the stage. Henceforth, the authors will compare with real data of exposure apparatus in recent days.