First Demonstration of 25-nm Quad Interface p-MTJ Device With Low Resistance-Area Product MgO and Ten Years Retention for High Reliable STT-MRAM
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T. Endoh | S. Ikeda | S. Miura | H. Honjo | M. Yasuhira | T. Watanabe | H. Inoue | T. Nasuno | Y. Noguchi | H. Naganuma | T. V. A. Nguyen | K. Nishioka