Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning

Abstract. BK7 glass substrates were precleaned by different cleaning procedures before being loaded into a vacuum chamber, and then a series of plasma ion cleaning procedures were conducted at different bias voltages in the vacuum chamber, prior to the deposition of 532-nm antireflection (AR) coatings. The plasma ion cleaning process was implemented by the plasma ion bombardment from an advanced plasma source. The surface morphology of the plasma ion-cleaned substrate, as well as the laser-induced damage threshold (LIDT) of the 532-nm AR coating was investigated. The results indicated that the LIDT of 532-nm AR coating can be greatly influenced by the plasma ion cleaning energy. The plasma ion cleaning with lower energy is an attractive method to improve the LIDT of the 532-nm AR coating, due to the removal of the adsorbed contaminations on the substrate surface, as well as the removal of part of the chemical impurities hidden in the surface layer.

[1]  Jianda Shao,et al.  Improving laser damage resistance of 355 nm high-reflective coatings by co-evaporated interfaces. , 2016, Optics letters.

[2]  Tadahiro Ohmi,et al.  In situ substrate surface cleaning by low‐energy ion bombardment for high quality thin film formation , 1993 .

[3]  Jean-Luc Rullier,et al.  Initiation of laser-induced damage sites in fused silica optical components. , 2009, Optics express.

[4]  Kunio Yoshida,et al.  Measurement of Laser Damage Threshold of 355-nm Antireflection Coating , 1989 .

[5]  Dichun Chen,et al.  Effect of ion cleaning pretreatment on interface microstructure, adhesive strength and tribological properties of GLC coatings on Al substrates , 2012 .

[6]  Jean M. Bennett.  How to clean surfaces , 2004, SPIE Laser Damage.

[7]  Gregory W. Auner,et al.  Role of cleaning methods on bond quality of Ti coated glass/imidex system , 2011 .

[8]  K. Matl,et al.  Plasma-ion-assisted deposition: a powerful technology for the production of optical coatings , 1997, Optics & Photonics.

[9]  Jianda Shao,et al.  The effects of ion cleaning on the roughness of substrates and laser induced damage thresholds of films , 2004 .

[10]  Liu Hongjie,et al.  Subsurface defects of fused silica optics and laser induced damage at 351 nm. , 2013, Optics express.

[11]  Jianda Shao,et al.  Experimental demonstration of laser damage caused by interface coupling effects of substrate surface and coating layers. , 2015, Optics letters.

[12]  Jérôme Néauport,et al.  Concerning the impact of polishing induced contamination of fused silica optics on the laser-induced damage density at 351 nm , 2008 .

[13]  D. Ochs,et al.  Glass substrate cleaning using a low energy ion source , 2001 .

[14]  J. Néauport,et al.  Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm. , 2005, Optics express.

[15]  D. G. Teer,et al.  The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating , 1999 .

[16]  Jian Sun,et al.  Influence of SiO2 undercoat on the laser-induced damage threshold of 355 nm LaF3/AlF3 multilayer reflectors , 2013 .

[17]  Jp Coad,et al.  The effects of substrate heating and ion cleaning on thick film adhesion , 1981 .

[18]  Jean M. Bennett.  Dos and don'ts in characterizing and cleaning optical surfaces , 2005, SPIE Optical Systems Design.

[19]  Jianda Shao,et al.  Effects of substrate temperatures on the characterization of magnesium fluoride thin films in deep-ultraviolet region. , 2014, Applied optics.

[20]  Norbert Kaiser,et al.  A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition , 2002 .

[21]  Roland Thielsch,et al.  Properties of SiO2 and Al2O3 films for use in UV optical coatings , 1997, Optics & Photonics.

[22]  Lars Nyborg,et al.  Effect of pre-treatment and nickel layer thickness on nickel silicide/silicon carbide contact , 2005 .

[23]  Minghong Yang,et al.  Reduction of the 355-nm laser-induced damage initiators by removing the subsurface cracks in fused silica , 2011, Other Conferences.

[24]  C. J. Stolz,et al.  Status of NIF mirror technologies for completion of the NIF facility , 2008, Optical Systems Design.

[25]  Mark R. Kozlowski,et al.  Depth profiling of polishing-induced contamination on fused silica surfaces , 1998, Laser Damage.

[26]  Christopher J. Stolz,et al.  Brewster Angle Polarizing Beamsplitter Laser Damage Competition: P polarization , 2012, Laser Damage.