Quantitative Optical Microscopy at the Nanoscale: New Developments and Comparisons

[1]  Bernd Bodermann,et al.  Comparison of far field characterisation of DOEs with a goniometric DUV-scatterometer and a CCD-based system , 2011 .

[2]  T. Gaylord,et al.  Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings , 1995 .

[3]  Olivier Hignette,et al.  Large-bandwidth deep-UV microscopy for CD metrology , 1990, Advanced Lithography.

[4]  Anja Rosenbusch,et al.  Inspection of EAPSMs for 193-nm technology generation using a UV-based 365-nm reticle inspection tool , 2002, SPIE Photomask Technology.

[5]  James E. Potzick,et al.  New NIST Photomask Linewidth Standard , 2002, Photomask Technology.

[6]  Nicholas G. Doe,et al.  New algorithm for optical photomask CD metrology for the 100-nm node , 2002, SPIE Photomask Technology.

[7]  Dirk Beyer,et al.  In-die metrology on photomasks for low k1 lithography , 2009, Photomask Technology.

[8]  Peter De Bisschop,et al.  Phame: phase measurements on 45nm node phase shift features , 2008, Photomask Japan.

[9]  Gerd Scheuring,et al.  New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser , 2008, European Mask and Lithography Conference.

[10]  R. Sec..  XV. On the theory of optical images, with special reference to the microscope , 2009 .

[11]  Denaturing of single electrospun fibrinogen fibers studied by deep ultraviolet fluorescence microscopy , 2011, Microscopy research and technique.

[12]  Wolfgang Osten,et al.  Simulations of Scatterometry Down to 22 nm Structure Sizes and Beyond with Special Emphasis on LER , 2009 .

[13]  Dirk Beyer,et al.  PROVE: a photomask registration and overlay metrology system for the 45 nm node and beyond , 2008, Photomask Japan.

[14]  Werner Mirande,et al.  Multi-wavelength VIS/UV optical diffractometer for high-accuracy calibration of nano-scale pitch standards , 2007 .

[15]  H. Bosse,et al.  An approach to validation of rigorous modeling in optical CD microscopy by comparison of measurement results with independent methods , 2007, SPIE Optical Metrology.

[16]  John M. Whittey,et al.  Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs , 2002, SPIE Photomask Technology.

[17]  Masaki Saito,et al.  New deep-UV microscope , 1999, Other Conferences.

[18]  Harald Bosse,et al.  An electron optical metrology system for pattern placement measurements , 1998 .

[19]  Bernd Bodermann,et al.  Optical metrology of micro- and nanostructures at PTB: status and future developments , 2008, International Symposium on Laser Metrology.

[20]  Kai Dirscherl,et al.  NANO5—2D Grating—Final report , 2008 .

[21]  Robert M. Glaeser,et al.  UV microscopy at 280 nm is effective in screening for the growth of protein microcrystals , 2005 .

[22]  Stephen Hsu,et al.  High-resolution actinic imaging and phase metrology of 193-nm CPL reticles , 2004, SPIE Photomask Technology.

[23]  Wolfgang Osten,et al.  Rapid quantitative phase imaging using phase retrieval for optical metrology of phase-shifting masks , 2003, SPIE Optical Metrology.

[24]  Bernd Bodermann,et al.  A new high-aperture 193 nm microscope for the traceable dimensional characterization of micro- and nanostructures , 2009 .

[25]  S. Hell,et al.  Breaking the diffraction resolution limit by stimulated emission: stimulated-emission-depletion fluorescence microscopy. , 1994, Optics letters.

[26]  Bernd Bodermann,et al.  A 193nm optical CD metrology tool for the 32nm node , 2009, Photomask Technology.

[27]  D. Nyyssonen.  Theory of optical edge detection and imaging of thick layers , 1982 .

[28]  M. Gustafsson.  Surpassing the lateral resolution limit by a factor of two using structured illumination microscopy , 2000, Journal of microscopy.

[29]  R. Silver,et al.  Linewidth measurement technique using through-focus optical images. , 2008, Applied optics.

[30]  Bernd Bodermann,et al.  A 193nm microscope for CD metrology for the 32nm node and beyond , 2010, European Mask and Lithography Conference.

[31]  Gaoliang Dai,et al.  A nanoscale linewidth/pitch standard for high-resolution optical microscopy and other microscopic techniques , 2007 .

[32]  C. P. Kirk,et al.  Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory , 1988 .

[33]  M. Totzeck,et al.  Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields , 2001 .

[34]  P. French,et al.  Optical sectioning microscopes with no moving parts using a micro-stripe array light emitting diode. , 2007, Optics express.

[35]  Erez Graitzer,et al.  Mask CD control (CDC) using AIMS as the CD metrology data source , 2008, Photomask Japan.

[36]  Bernd Bodermann,et al.  Quantitative linewidth measurement down to 100 nm by means of optical dark-field microscopy and rigorous model-based evaluation , 2007 .

[37]  E. Abbe.  Beiträge zur Theorie des Mikroskops und der mikroskopischen Wahrnehmung , 1873 .

[38]  Bernd Bodermann,et al.  Theoretical modelling and experimental verification of the influence of Cr edge profiles on microscopic-optical edge signals for COG masks , 2006, SPIE Photomask Technology.

[39]  Bernd Bodermann,et al.  A new flexible scatterometer for critical dimension metrology. , 2010, The Review of scientific instruments.

[40]  Bryan M. Barnes,et al.  193 nm angle-resolved scatterfield microscope for semiconductor metrology , 2009, NanoScience + Engineering.

[41]  S. Hell.  Far-Field Optical Nanoscopy , 2007, Science.

[42]  M. Gustafsson.  Nonlinear structured-illumination microscopy: wide-field fluorescence imaging with theoretically unlimited resolution. , 2005, Proceedings of the National Academy of Sciences of the United States of America.

[43]  J. Lippincott-Schwartz,et al.  Imaging Intracellular Fluorescent Proteins at Nanometer Resolution , 2006, Science.

[44]  T. Wilson,et al.  Method of obtaining optical sectioning by using structured light in a conventional microscope. , 1997, Optics letters.

[45]  Harald Bosse,et al.  Calibration of CD mask standards for the 65-nm node: CoG and MoSi , 2007, European Mask and Lithography Conference.

[46]  Robert K. Henderson.  Beta test performance of the Leica LWM 250 UV CD measurement tool , 1999, Photomask Technology.

[47]  Michael J Rust,et al.  Sub-diffraction-limit imaging by stochastic optical reconstruction microscopy (STORM) , 2006, Nature Methods.

[48]  Matthias Wurm,et al.  Metrology capabilities and performance of the new DUV scatterometer of the PTB , 2007, European Mask and Lithography Conference.

[49]  E. Menzel,et al.  Fourier-Optik und Holographie , 1973 .

[50]  Harald Bosse,et al.  Characterization of new CD photomask standards , 2004, SPIE Advanced Lithography.

[51]  C. G. Frase,et al.  Model-based SEM for dimensional metrology tasks in semiconductor and mask industry , 2009 .

[52]  S. Hell,et al.  Subdiffraction resolution in far-field fluorescence microscopy. , 1999, Optics letters.

[53]  Liren Liu,et al.  Tunable transverse superresolution with phase-only pupil filters , 2006 .

[54]  H. Hopkins.  On the diffraction theory of optical images , 1953, Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences.

[55]  Christian Eggeling,et al.  STED microscopy reveals crystal colour centres with nanometric resolution. , 2009 .