Fabrication and electrical characterization of 5×50um through silicon vias for 3D integration
暂无分享,去创建一个
Niranjan Kumar | Bharat Bhushan | Sesh Ramaswami | Minrui Yu | John Dukovic | Loke Yuen Wong | Aksel Kitowski | Mun Kvu Park | John Hua | Shwetha Bolagond | Anthony C.-T Chan | Chin Hock Toh | Arvind Sundarrajan
[1] Edmund J. Sprogis,et al. Wafer-level 3D integration technology , 2008, IBM J. Res. Dev..
[2] K. Croes,et al. Electrical characterization method to study barrier integrity in 3D through-silicon vias , 2012, 2012 IEEE 62nd Electronic Components and Technology Conference.
[3] B. Sorée,et al. Temperature-Dependent Modeling and Characterization of Through-Silicon Via Capacitance , 2011, IEEE Electron Device Letters.
[4] C.H. Chang,et al. Yield and reliability of 3DIC technology for advanced 28nm node and beyond , 2011, 2011 Symposium on VLSI Technology - Digest of Technical Papers.
[5] H. Grubin. The physics of semiconductor devices , 1979, IEEE Journal of Quantum Electronics.
[6] S. Ramaswami,et al. Robust TSV via-middle and via-reveal process integration accomplished through characterization and management of sources of variation , 2012, 2012 IEEE 62nd Electronic Components and Technology Conference.
[7] Mitsumasa Koyanagi,et al. High-Density Through Silicon Vias for 3-D LSIs , 2009, Proceedings of the IEEE.
[8] Dimitrios Velenis,et al. Capacitance Measurements of Two-Dimensional and Three-Dimensional IC Interconnect Structures by Quasi-Static $C$–$V$ Technique , 2012, IEEE Transactions on Instrumentation and Measurement.
[9] K. Ng,et al. The Physics of Semiconductor Devices , 2019, Springer Proceedings in Physics.
[10] Banqiu Wu,et al. 3D IC Stacking Technology , 2011 .
[11] Ankur Jain,et al. Electrical modeling and characterization of through-silicon vias (TSVs) for 3-D integrated circuits , 2008, Microelectron. J..