Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility
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Friso Wittebrood | Timon Fliervoet | Mark van de Kerkhof | Dorothe Oorschot | Bartosz Bilski | John McNamara | Ziyang Wang
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[2] Gijsbert Rispens,et al. Contrast optimization for 0.33NA EUV lithography , 2016, SPIE Advanced Lithography.