论文信息 - Control of Si-SiO 2 Interface Properties in MOS Devices Prepared by Plasma-Assisted and Rapid Thermal Processes - 字舞流文

Control of Si-SiO 2 Interface Properties in MOS Devices Prepared by Plasma-Assisted and Rapid Thermal Processes

Veena Misra | B. Hornung | G. Lucovsky | S. V. Hattangady | X.-L. Xu | J. Wortman | V. Misra | G. Lucovsky | S. Hattangady | T. Yasuda | T. Yasuda | Jim J. Wortman | Y. Ma | B. Hornung | X.-L. Xu | Y. Ma

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