Efficient fabrication of ultrasmooth and defect-free quartz glass surface by hydrodynamic effect polishing combined with ion beam figuring.

Material removal rate has greatly relied on the distribution of shear stress and dynamic pressure on the workpiece surface in hydrodynamic effect polishing (HEP). Fluid dynamic simulation results demonstrate that the higher rotation speed and smaller clearance will cause the larger material removal rate. Molecular dynamic (MD) calculations show the bonding energy of Si-O in the silicon-oxide nanoparticle is stronger than that in the quartz glass, and therefore the atoms can be dragged away from the quartz glass surface by the adsorbed silicon-oxide nanoparticle. The deep subsurface damage cannot be efficiently removed by HEP due to its extremely low removal rate. However, the subsurface damaged layer can be quickly removed by ion beam figuring (IBF), and a thinner layer containing the passivated scratches and pits will be left on the surface. The passivated layer is so thin that can be easily removed by HEP process with a low material rate under the large wheel-workpiece clearance. Combined with the IBF process, the subsurface damage and surface scratches have been efficiently removed after the HEP process. Meanwhile there are not obvious duplicated marks on the processed surface and the surface roughness has been improved to 0.130nm rms, 0.103nm Ra.

[1]  J. Bennett,et al.  Float polishing of optical materials. , 1987, Applied optics.

[2]  Y. Mori,et al.  Elastic Emission Machining , 1987 .

[3]  L. Cook.  Chemical processes in glass polishing , 1990 .

[4]  D. R. Baselt,et al.  Float-polishing process and analysis of float-polished quartz. , 1994, Applied optics.

[5]  M. Negishi,et al.  Super-smooth polishing on aspherical surfaces , 1995 .

[6]  J. Bennett,et al.  Effect of surface roughness and subsurface damage on grazing-incidence x-ray scattering and specular reflectance. , 1998, Applied optics.

[7]  Yuzo Mori,et al.  First-principles simulations of removal process in EEM (Elastic Emission Machining) , 1999 .

[8]  Carlo G. Pantano,et al.  A Study of Glass Surface Heterogeneity and Silylation by Inverse Gas Chromatography , 2002 .

[9]  Xuewei Wu,et al.  Optical emission from SiOx (x=1.2–1.6) nanoparticles irradiated by ultraviolet ozone , 2003 .

[10]  Markus Rupp,et al.  Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography , 2004, SPIE Optics + Photonics.

[11]  Gu Zhenan,et al.  STUDY ON REACTION KINETICS BETWEEN SILICA GLASSES AND HYDROFLUORIC ACID , 2004 .

[12]  Jianda Shao,et al.  Subsurface damage in optical substrates , 2005 .

[13]  Y. Mori,et al.  Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics , 2007 .

[14]  Y. Mori,et al.  Processing efficiency of elastic emission machining for low‐thermal‐expansion material , 2008 .

[15]  Yong Zhang,et al.  Figuring of an ultra-smooth surface in nanoparticle colloid jet machining , 2009 .

[16]  Georg Böhm,et al.  Ultra-precision surface finishing by ion beam and plasma jet techniques—status and outlook , 2010 .

[17]  P. He,et al.  Evaluation and analysis of polished fused silica subsurface quality by the nanoindenter technique. , 2011, Applied optics.

[18]  Xuhui Xie,et al.  Ion beam machining error control and correction for small scale optics. , 2011, Applied optics.

[19]  Junlin Wang,et al.  Supersmooth polishing with sub-angstron roughness , 2012, Other Conferences.

[20]  S. Nahm,et al.  Microstructures and electrochemical performances of nano-sized SiOx (1.18 ≤ x ≤ 1.83) as an anode material for a lithium(Li)-ion battery , 2013 .

[21]  Shengyi Li,et al.  Ultrasmooth surface polishing based on the hydrodynamic effect. , 2013, Applied optics.

[22]  Xinmin Shen,et al.  Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing , 2013 .