Surface cleaning and preparation in AlGaN/GaN-based HEMT processing as assessed by X-ray photoelectron spectroscopy
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S. Moisa | Haipeng Tang | S. Moisa | J. Bardwell | A. Braña | S. Haffouz | E. Muñoz | Elías Muñoz | Jennifer A. Bardwell | F. Gonzalez-Posada | A. F. Braña | Fernando González-Posada | Soufien Haffouz | H. Tang | F. Gonzalez‐Posada
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