Chemical Vapor Deposition of HfO2 Thin Films Using the Novel Single Precursor Hafnium 3-Methyl-3-pentoxide, Hf(mp)4
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K. An | Taek-seung Yang | Nam-Soo Lee | Jin-Ha Hwang | Taek‐Mo Chung | Sungmoon Kim | Y. Lee | Yunsoo Kim | W. Cho | H. Jang | C. Kim | S. K. Park | C. Lee | Eun-Joo Lee