DEFECTS IN STRAINED LAYER SEMICONDUCTORS.

The improvement in vacuum deposition technologies such as molecular beam epitaxy (MBE) and metallorganic chemical vapor deposition (MOCVD) has enabled the latticemismatched, pseudomorphic growth of epitaxial systems. These strained layer systems allow for a wide flexibility in tailoring semiconductor heterostructures for certain electronic band gaps. To the materials scientist, this means a wider choice of materials in this field of “band-gap engineering.” As in any engineering application of materials, defects play a major role in materials fabrication and device performance. This paper considers some of the unique features of defects in strained layer semiconductors—both process- and service-induced.

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