论文信息 - Effects of Cu and Si Dopants on Electromigration Mass Transport in Al Interconnects for VLSI - 字舞流文

Effects of Cu and Si Dopants on Electromigration Mass Transport in Al Interconnects for VLSI

G. Grivna | P. Fejes | M. L. Dreyer | B. York | C. H. Lee | R. W. Carnes | S. Elwell | J. Lee | S. Bauguess | S. R. Edwards