论文信息 - Oxidation behaviour of Cu−Ni(Mn) (constantan) films

Oxidation behaviour of Cu−Ni(Mn) (constantan) films

Abstract The oxidation of constantan films has been investigated using Cu-Ni(Mn) single films and (Cu-Ni(Mn))-NiCr film configurations by measurements of electrical resistance and Auger electron spectra depth profiling, as well as by thermogravimetric and differential thermoanalytical studies. Oxidation starts under air and argon atmosphere between 300 and 350 °C. Under an N2-H2 gas mixture a passivating film formed by a double layer of manganese and chromium oxide reduces further oxidation strongly on the Cu-Ni(Mn) film with an NiCr adhesion layer. Further details of the oxidation mechanism are discussed in connection with the film recrystallization. A 60 nm NiCr covering layer protects well against oxidation.

[1] A. Heinrich,et al. Degradation of CrSi(W)O resistive films , 1992 .

[2] N. G. Schmahl,et al. Zur Kenntnis des Systems Kupfer–Nickel–Sauerstoff , 1964 .

[3] W. Brückner,et al. Resistance behaviour and interdiffusion of layered CuNi−NiCr films , 1995 .

[4] H. Seidel. Zahlenwerte und Funktionen , 1965 .

[5] W. Brückner,et al. Properties and applications of vacuum-deposited CuCr films , 1993 .

[6] I. E. Klein,et al. The mechanism of oxidation of thin Ni−Cr films , 1988 .

[7] W. Brückner,et al. Growth of oxide layers on CrSiO films , 1993 .

[8] Paul A. Flinn,et al. Measurement and interpretation of stress in copper films as a function of thermal history , 1991 .

[9] K. Tsuji,et al. Conversion of sputtering time into depth in depth profiles of oxidized CuNi alloys obtained by glow discharge spectroscopy , 1991 .

[10] R. Souchet,et al. Study of copper-nickel alloy oxidation by FTIR and SIMS , 1993 .