Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication

Ever-increasing demands of smaller feature sizes and larger throughputs have catapulted the semicondutor lithography juggernaut to develop immensely complex and expensive systems. However, it is not clear if the lithography needs for microoptic and other “botique” device fabrication are being addressed. ZPAL is a new nanolithography technique which leverages advances in micromechanics and diffractive optics technologies. We present ZPAL as the ideal system for such non-conventional lithography needs.