论文信息 - Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers - 字舞流文

Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

C. Detavernier | D. van Thourhout | J. Dendooven | L. Martin | H. Rijckaert | I. Van Driessche | R. Petit | Nithin Poonkottil | Khannan Rajendran