Layered tunnel barriers for nonvolatile memory devices
暂无分享,去创建一个
[1] West,et al. Scanning Single-Electron Transistor Microscopy: Imaging Individual Charges , 1997, Science.
[2] D. Dimaria,et al. High current injection into SiO2 from Si rich SiO2 films and experimental applications , 1980 .
[3] William D. Brown,et al. Nonvolatile Semiconductor Memory Technology , 1997 .
[4] A. Wickenden,et al. The growth and properties of Al and AlN films on GaN(0001)–(1×1) , 1996 .
[5] W. Wiegmann,et al. New rectifying semiconductor structure by molecular beam epitaxy , 1980 .
[6] F. Capasso,et al. New floating-gate AlGaAs/GaAs memory devices with graded-gap electron injector and long retention times , 1988, IEEE Electron Device Letters.
[7] Calvin F. Quate,et al. Charge storage in a nitride‐oxide‐silicon medium by scanning capacitance microscopy , 1991 .
[8] K. Board,et al. Planar-doped barriers in GaAs by molecular beam epitaxy , 1980 .
[9] H. Grubin. The physics of semiconductor devices , 1979, IEEE Journal of Quantum Electronics.
[10] Betty Prince,et al. SEMICONDUCTOR MEMORIES , 2006 .
[11] V. I. Belyĭ. Silicon nitride in electronics , 1988 .
[12] Jaw-Shen Tsai,et al. Aluminum single-electron nonvolatile floating gate memory cell , 1997 .
[13] K. Likharev,et al. Nanoscale field-effect transistors: An ultimate size analysis , 1997, cond-mat/9706026.
[14] H. Morkoç,et al. GaN, AlN, and InN: A review , 1992 .