Solar grade silicon production: A review of kinetic, thermodynamic and fluid dynamics based continuum scale modeling
暂无分享,去创建一个
Chandra Veer Singh | Kinnor Chattopadhyay | C. V. Singh | Shwetank Yadav | K. Chattopadhyay | Shwetank Yadav
[1] Zhanying Yu,et al. Fluid Dynamic Simulations on Polysilicon Production , 2013 .
[2] Marco Andreoli,et al. A mathematical model for silicon chlorination , 2003 .
[3] Michael E. Coltrin,et al. Si Deposition Rates in a Two‐Dimensional CVD Reactor and Comparisons with Model Calculations , 1990 .
[4] G. C. Hsu,et al. Fines in Fluidized Bed Silane Pyrolysis , 1984 .
[5] P. J. O'rourke,et al. A model for collisional exchange in gas/liquid/solid fluidized beds , 2009 .
[6] S. K. Iya,et al. Heterogeneous Decomposition of Silane in a Fixed Bed Reactor , 1982 .
[7] W. Heywang,et al. Twenty five years of semiconductor‐grade silicon , 1981 .
[8] Mark T. Swihart,et al. On the mechanism of homogeneous decomposition of the chlorinated silanes. Chain reactions propagated by divalent silicon species , 1998 .
[9] Toshinori Kojima,et al. CHEMICAL VAPOR DEPOSITION AND HOMOGENEOUS NUCLEATION IN MONOSILANE PYROLYSIS WITHIN INTERPARTICLE SPACES -APPLICATION OF FINES FORMATION ANALYSIS TO FLUIDIZED BED CVD- , 1988 .
[10] Francine Fayolle. Analyse et modélisation des dépots d'oxyde de silicium par procédé LPCVD , 1993 .
[11] Francine Battaglia,et al. Theoretical study of the pyrolysis of methyltrichlorosilane in the gas phase. 3. Reaction rate constant calculations. , 2010, The journal of physical chemistry. A.
[12] Donald P. Greenberg,et al. The hemi-cube: a radiosity solution for complex environments , 1985, SIGGRAPH.
[13] Hao Yin Ni,et al. Computational Results Show Gas Phase Reactions Have Great Impact on the Deposition Rate of Silicon in Siemens CVD Reactors , 2015 .
[14] Jing-Bo Wang,et al. Theoretical study on the SiH4−nCln (n = 0–4) reaction mechanisms for polysilicon production process , 2014 .
[15] Tetsuya Tsuda,et al. Improving Purity and Process Volume During Direct Electrolytic Reduction of Solid SiO2 in Molten CaCl2 for the Production of Solar‐Grade Silicon , 2013 .
[16] Eivind J. Øvrelid,et al. Solar Silicon Processes : Technologies, Challenges, and Opportunities , 2016 .
[17] A. D. Gosman,et al. Two calculation procedures for steady, three-dimensional flows with recirculation , 1973 .
[18] Carl L. Yaws,et al. New technologies for solar energy silicon - Cost analysis of BCL process , 1979 .
[19] Palligarnai T. Vasudevan,et al. How to Estimate Utility Costs , 2006 .
[20] D. Gidaspow. Multiphase Flow and Fluidization: Continuum and Kinetic Theory Descriptions , 1994 .
[21] Tengfei Cao,et al. Numerical study of Si nanoparticle formation by SiCl4 hydrogenation in RF plasma , 2016 .
[22] Ahmed Dkhissi,et al. A theoretical study of standard heat of formation of systems involving in the zinc reduction of silicon tetrachloride , 2014, Theoretical Chemistry Accounts.
[23] 张攀,et al. Effect of Boundary Layers on Polycrystalline Silicon Chemical Vapor Deposition in a Trichlorosilane and Hydrogen System , 2011 .
[24] Nicolas Reuge,et al. Modeling of Silicon CVD into Agglomerates of Sub-micrometer-size Particles in a Fluidized Bed† , 2011 .
[25] Gret Hsu. Fluidized-bed development at JPL , 1986 .
[26] Yang Yuan,et al. Reactive Distillation Columns with Multiple Reactive Sections: A Case Study on the Disproportionation of Trichlorosilane to Silane , 2017 .
[27] L. Johanson,et al. Characteristics of gas pockets in fluidized beds , 1958 .
[28] B. Erik Ydstie,et al. Size distribution modeling for fluidized bed solar-grade silicon production☆ , 2006 .
[29] Xun Huang,et al. Reactive Distillation-Aided Ultrapure Silane Production from Trichlorosilane: Process Simulation and Optimization , 2017 .
[30] C. Wen,et al. A generalized method for predicting the minimum fluidization velocity , 1966 .
[31] Hitoshi Habuka,et al. Nonlinear increase in silicon epitaxial growth rate in a SiHCl3H2 system under atmospheric pressure , 1997 .
[32] Paul E. Ege,et al. Multi‐scale Modeling and Constrained Sensitivity Analysis of Particulate CVD Systems , 2007 .
[33] Juan Du,et al. Modeling and control of particulate processes and application to poly-silicon production , 2012 .
[34] M. Pinar Mengüç,et al. Thermal Radiation Heat Transfer , 2020 .
[35] Zhi Feng Nie,et al. Numerical Simulation of Polysilicon Chemical Vapor Deposition in Siemens Reactor , 2015 .
[36] Juan Du,et al. Modeling and control of solar‐grade silicon production in a fluidized bed reactor , 2014 .
[37] Kemei Pei,et al. Ab initio and kinetic calculations for the reactions of Cl with SiHnCl4−n (n=1,2,3,4) , 2004 .
[38] Ranko Goic,et al. review of solar photovoltaic technologies , 2011 .
[39] Antonio Luque,et al. Temperature homogeneity of polysilicon rods in a Siemens reactor , 2007 .
[40] Yanqing Hou,et al. Electric heating of the silicon rods in Siemens reactor , 2015 .
[41] Jihai Duan,et al. Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon , 2011 .
[42] Xun Huang,et al. Reactive Distillation Column for Disproportionation of Trichlorosilane to Silane: Reducing Refrigeration Load with Intermediate Condensers , 2013 .
[43] M. C. Melaaen,et al. Chemical vapor deposition of silicon from silane: Review of growth mechanisms and modeling/scaleup of fluidized bed reactors , 2012 .
[44] Maurizio Masi,et al. Reduced order model for the CVD of epitaxial silicon from silane and chlorosilanes , 2001 .
[45] Robert J. Kee,et al. A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor , 1989 .
[46] John Houseman,et al. Silicon particle growth in a fluidized‐bed reactor , 1987 .
[47] Fang Liu,et al. Hydrodynamic behaviors of an internally circulating fluidized bed with wide-size-distribution particles for preparing polysilicon granules , 2015 .
[48] G. C. Hsu,et al. Chemical Vapor Deposition of Silicon from Silane Pyrolysis , 1977 .
[49] Octave Levenspiel,et al. Fluidized reactor models. 1. For bubbling beds of fine, intermediate, and large particles. 2. For the lean phase: freeboard and fast fluidization , 1990 .
[50] Nasrudin Abd Rahim,et al. Progress in solar PV technology: Research and achievement , 2013 .
[51] Akio Fuwa,et al. Kinetics of the Conversion of Silicon Tetrachloride into Trichlorosilane Obtained through the Temperature Control along a Plug-Flow Reactor , 2016 .
[52] Caixia Chen,et al. Modeling and simulation of silicon epitaxial growth in Siemens CVD reactor , 2014 .
[53] Gøran Bye,et al. Solar grade silicon: Technology status and industrial trends , 2014 .
[54] Kai Guo,et al. Numerical simulation of multiple polysilicon CVD reactors connected in series using CFD method , 2015 .
[55] D. Mortensen,et al. 3D dynamic simulation of heat transfer and melt flow in an inductively heated crystallization furnace for mc-silicon with PID temperature control , 2013 .
[56] M. Syamlal,et al. A numerical model of silane pyrolysis in a gas-solids fluidized bed , 1998 .
[57] Hiroshi Komiyama,et al. Reaction of Si with HCl to Form Chlorosilanes Time Dependent Nature and Reaction Model , 2004 .
[58] T. R. Hogness,et al. The Thermal Decomposition of Silane , 1936 .
[59] Rohatgi. Silicon production in a fluidized bed reactor: Final report , 1986 .
[60] Juan Du,et al. Multi-scale modeling and control of fluidized beds for the production of solar grade silicon ☆ , 2010 .
[61] Kouji Yasuda,et al. Processes for Production of Solar‐Grade Silicon Using Hydrogen Reduction and/or Thermal Decomposition , 2014 .
[62] Yueshu Gu,et al. Direct ab Initio Dynamics Studies of the Reactions of H with SiH4-nCln (n = 1−3) , 2002 .
[63] Akio Fuwa,et al. Hydrogenation Reactions and Their Kinetics for SiCl 4 (g)–H 2 (g) and SiCl 4 (g)–Si(s)–H 2 (g) Systems Using a Fixed Bed Type Reactor , 1992 .
[64] Akio Fuwa,et al. Kinetic study of silicon precipitation from SiHCl3 , 1994 .
[65] Dimitrios Maroudas,et al. Kinetic Monte Carlo simulations of surface growth during plasma deposition of silicon thin films. , 2009, The Journal of chemical physics.
[66] Mark T. Swihart,et al. THERMOCHEMISTRY AND THERMAL DECOMPOSITION OF THE CHLORINATED DISILANES (SI2HNCL6-N, N = 0-6) STUDIED BY AB INITIO MOLECULAR ORBITAL METHODS , 1997 .
[67] Seung Hyun Kim,et al. Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor , 2012 .
[68] Nicolas Reuge,et al. Multifluid Eulerian modelling of a silicon Fluidized Bed Chemical Vapor Deposition process: Analysis of various kinetic models , 2009 .
[69] H. Bernhard Schlegel,et al. An ab initio study of the thermal decomposition of dichlorosilane , 1997 .
[70] Chris R. Kleijn,et al. Computational modeling of transport phenomena and detailed chemistry in chemical vapor deposition : a benchmark solution , 2000 .
[71] M. Syamlal,et al. Fluid dynamic simulation of O3 decomposition in a bubbling fluidized bed , 2003 .
[72] H. Bernhard Schlegel,et al. An ab initio MO study of the thermal decomposition of chlorinated monosilanes, SiH4-nCln (n = 0-4) , 1993 .
[73] Liang-Shih Fan,et al. Characteristics of fluidization at high pressure , 1984 .
[74] Pei Zhai,et al. Dynamic hybrid life cycle assessment of energy and carbon of multicrystalline silicon photovoltaic systems. , 2010, Environmental science & technology.
[75] Yanqing Hou,et al. Thermodynamic behaviors of SiCl2 in silicon deposition by gas phase zinc reduction of silicon tetrachloride , 2015 .
[76] Wen-De Xiao,et al. Silane Pyrolysis to Silicon Rod in a Bell-Jar Reactor at High Temperature and Pressure: Modeling and Simulation , 2016 .
[77] Zheqing Huang,et al. Numerical Solution for Radiative Heat Transfer in a Novel Polysilicon CVD Reactor , 2013 .
[78] Maurizio Masi,et al. Modeling of flame assisted chemical vapor deposition of silicon films , 2011 .
[79] Jijun Wu,et al. Thermodynamic Estimation of Silicon Tetrachloride to Trichlorosilane by a Low Temperature Hydrogenation Technique , 2015, Silicon.
[80] Si-Si Liu,et al. Numerical simulations of particle growth in a silicon-CVD fluidized bed reactor via a CFD–PBM coupled model , 2014 .
[81] D. Geldart. Types of gas fluidization , 1973 .
[82] Robert J. Kee,et al. A Mathematical Model of Silicon Chemical Vapor Deposition Further Refinements and the Effects of Thermal Diffusion , 1986 .
[83] Xigang Yuan,et al. Development of a Polysilicon Chemical Vapor Deposition Reactor Using the Computational Fluid Dynamics Method , 2013 .
[84] Joachim Werther,et al. Scale-up modeling for fluidized bed reactors , 1992 .
[85] Guanghui Cheng,et al. Effect of Boundary Layers on Polycrystalline Silicon Chemical Vapor Deposition in a Trichlorosilane and Hydrogen System , 2011 .
[86] S. K. Tyagi,et al. Recent advances in solar photovoltaic systems for emerging trends and advanced applications , 2016 .
[87] M. Streat,et al. Mass transfer in fixed and fluidized beds , 1985 .
[88] Wei-Jie Ding,et al. CuCl-Catalyzed Hydrogenation of Silicon Tetrachloride in the Presence of Silicon: Mechanism and Kinetic Modeling , 2014 .
[89] Takao Masuda,et al. Growth Kinetics of Polycrystalline Silicon from Silane by Thermal Chemical Vapor Deposition Method , 1990 .
[90] Wei-Jie Ding,et al. Hydrogenation of Silicon Tetrachloride in the Presence of Silicon: Thermodynamic and Experimental Investigation , 2014 .
[91] K. Kato,et al. Bubble assemblage model for fluidized bed catalytic reactors , 1969 .
[92] Hallvard G. Fjær,et al. Crystallization Furnace Modeling Including Coupled Heat and Fluid Flow, Stresses and Deformations , 2013 .
[93] Anuj Srivastava,et al. Analysis of a frictional-kinetic model for gas-particle flow , 2003 .
[94] Xin-Peng Yu,et al. Direct Ab Initio Dynamics Studies of the Reaction Paths and Rate Constants of Hydrogen Atom with Germane and Silane , 2000 .
[95] James M. Parker. Validation of CFD Model for Polysilicon Deposition and Production of Silicon Fines in a Silane Deposition FBR , 2011 .
[96] Srinivas Palanki,et al. Modeling the hydrochlorination reaction in a laboratory-scale fluidized bed reactor , 2016 .
[97] C. del Cañizo,et al. Deposition reactors for solar grade silicon: a comparative thermal analysis of a Siemens reactor and a fluidized bed reactor , 2015 .
[98] P. Ho,et al. Chemical Kinetics for Modeling Silicon Epitaxy from Chlorosilanes , 1998 .
[99] Huang Guoqiang,et al. Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane , 2014 .
[100] V. M. Ivanov,et al. Approaches to hydrogenation of silicon tetrachloride in polysilicon manufacture , 2011 .
[101] Chia-Jung Hsu. Numerical Heat Transfer and Fluid Flow , 1981 .
[102] Jong Hyun Jeong,et al. Computational Fluid Dynamics Modeling of Mono-Silane Siemens Reactor , 2012 .
[103] Qingfeng Zeng,et al. Thermodynamics of the gas-phase reactions in chemical vapor deposition of silicon carbide with methyltrichlorosilane precursor , 2008 .
[104] Merete Tangstad,et al. Vacuum Refining of Molten Silicon , 2012, Metallurgical and Materials Transactions B.
[105] D. Pera,et al. Inline fast CVD sysyem for continuous production of silicon ribbons for solar cells by the SDS process , 2009, 2009 34th IEEE Photovoltaic Specialists Conference (PVSC).
[106] B. Erik Ydstie,et al. Silicon solar cell production , 2011, Comput. Chem. Eng..
[107] Christopher E. Dateo,et al. Thermal Decomposition Pathways and Rates for Silane, Chlorosilane, Dichlorosilane, and Trichlorosilane , 2001 .
[108] Hyung Hee Cho,et al. Effect of extended single/multi-jet nozzles in a fluidized bed reactor on growth of granular polysilicon , 2014 .
[109] Stephen B. Pope,et al. Computationally efficient implementation of combustion chemistry using in situ adaptive tabulation , 1997 .
[110] Milorad P. Dudukovic,et al. Chemical vapor deposition and homogeneous nucleation in fluidized bed reactors: silicon from silane , 1986 .
[111] Erik Stensrud Marstein,et al. Development of fluidized bed reactors for silicon production , 2010 .
[112] Christopher E. Dateo,et al. Reactions of SiCl2 and SiHCl with H and Cl atoms , 2002 .
[113] Maurizio Masi,et al. Analysis of the gas phase reactivity of chlorosilanes. , 2013, The journal of physical chemistry. A.
[114] Bjørn F. Magnussen,et al. THE EDDY DISSIPATION CONCEPT A BRIDGE BETWEEN SCIENCE AND TECHNOLOGY , 2005 .
[115] Antonio Luque,et al. Radiative energy loss in a polysilicon CVD reactor , 2011 .
[116] Hitoshi Habuka,et al. Model on transport phenomena and epitaxial growth of silicon thin film in SiHCl3H2 system under atmospheric pressure , 1996 .
[117] Antonio Luque,et al. Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System , 2008 .
[118] Muyu Zhao,et al. Determining the number of independent components by Brinkley's method , 1992 .
[119] D. Brian Spalding,et al. Numerical computation of multi-phase fluid flow and heat transfer , 1980 .
[120] M. Modest. Radiative heat transfer , 1993 .
[121] M. Bellmann,et al. A novel method for gas flow and impurity control in directional solidification of multi-crystalline silicon , 2014 .
[122] Xin Wang,et al. Two-dimensional temperature distribution in fluidized bed reactors for synthesizing trichlorosilane , 2011 .
[123] S. Patankar. Numerical Heat Transfer and Fluid Flow , 2018, Lecture Notes in Mechanical Engineering.
[124] Antonio Luque,et al. Heat losses in a CVD reactor for polysilicon production: Comprehensive model and experimental validation , 2014 .
[125] Akio Fuwa,et al. Effects of cluster size on calculation of activation energies of silicon surface reactions with H2 and HCl , 2015 .
[126] Maurizio Masi,et al. Kinetics of SiHCl3 chemical vapor deposition and fluid dynamic simulations. , 2011, Journal of nanoscience and nanotechnology.
[127] Mitsuo Koshi,et al. Channel specific rate constants relevant to the thermal decomposition of disilane. , 2005, The journal of physical chemistry. A.
[128] Sergey M. Karabanov,et al. Mathematical modeling and experimental research of the method of plasma chemical purification of metallurgical-grade silicon , 2016, 2016 IEEE 16th International Conference on Environment and Electrical Engineering (EEEIC).
[129] Stephen J. Clarson,et al. Pathways to Solar Grade Silicon , 2015, Silicon.
[130] Jian Long Li,et al. CFD Study on Polycrystalline Silicon Chemical Vapor Deposition in a Rib Reactor , 2010, 2010 Asia-Pacific Power and Energy Engineering Conference.
[131] Antonio Luque,et al. Radiation heat savings in polysilicon production: Validation of results through a CVD laboratory prototype , 2013 .
[132] M. P. Jain,et al. Studies on Hydrochlorination of Silicon in a Fixed Bed Reactor , 2010 .
[133] S. R. Mathur,et al. Coupled Ordinates Method for Multigrid Acceleration of Radiation Calculations , 1999 .
[134] 徐睿,et al. Simulation and analysis of Si deposition in turbulent CVD reactors , 2014 .
[135] D. Snider. An incompressible three-dimensional multiphase particle-in-cell model for dense particle flows , 2001 .
[136] David G. Schaeffer,et al. Instability in the evolution equations describing incompressible granular flow , 1987 .
[137] Takamasa Momose,et al. Thermal rate constants for SiH4⇄SiH3+H and CH4⇄CH3+H by canonical variational transition state theory , 1994 .
[138] Woo Kyoung Kim,et al. Effect of Rod Diameters on Flow Pattern and Temperature Profile in Monosilane Siemens Poly-Si Reactor , 2013 .
[139] Dale M. Snider,et al. Three fundamental granular flow experiments and CPFD predictions , 2007 .
[140] Si-Si Liu,et al. CFD–PBM coupled simulation of silicon CVD growth in a fluidized bed reactor: Effect of silane pyrolysis kinetic models , 2015 .
[141] O. Levenspiel,et al. Bubbling Bed Model. Model for Flow of Gas through a Fluidized Bed , 1968 .
[142] Michael Woodhouse,et al. Economic Measurements of Polysilicon for the Photovoltaic Industry: Market Competition and Manufacturing Competitiveness , 2015, IEEE Journal of Photovoltaics.
[143] Juan Gabriel Segovia Hernández,et al. Silane Production through Reactive Distillation with Intermediate Condensers , 2015 .
[144] Francine Battaglia,et al. Simulations of multiphase reactive flows in fluidized beds using in situ adaptive tabulation , 2004 .
[145] Madhava Syamlal,et al. MFIX documentation numerical technique , 1998 .
[146] Manabu Kano,et al. New Synthesis Procedure To Find the Optimal Distillation Sequence with Internal and External Heat Integrations , 2013 .
[147] Madhava Syamlal,et al. Silicon CVD on powders in fluidized bed: Experimental and multifluid Eulerian modelling study , 2007 .
[148] W. Breiland,et al. Reactive sticking coefficients for silane and disilane on polycrystalline silicon , 1988 .